活化溅射法在NiTi合金上制备TiO_2生物薄膜  

Preparation of TiO_2 Thin Biofilm on NiTi Alloy by Activation Sputtering Method

作　　者：高淑春[1] 翟玉春[1] 姜妲[2] 王秋实[1] 

机构地区：[1]东北大学材料与冶金学院,辽宁沈阳110819 [2]沈阳航空航天大学材料科学与工程学院,辽宁沈阳110136

出　　处：《东北大学学报（自然科学版）》2013年第6期859-862,共4页Journal of Northeastern University(Natural Science)

基　　金：国家重点基础研究发展计划项目(2102CB619101)

摘　　要：采用活化溅射方法,在不同溅射电压条件下,在NiTi形状记忆合金表面成功制备出了纳米TiO2生物薄膜.采用台阶轮廓仪和拉曼光谱仪研究溅射电压对薄膜厚度和晶体结构的影响,并对NiTi合金覆膜前后在37℃模拟人体体液中的耐腐蚀性能进行了评价.结果表明,在本实验条件下薄膜为锐钛矿结构,薄膜表面均匀,其主要成分为纳米尺寸的TiO2;TiO2薄膜明显改善了NiTi合金在37℃模拟人体体液中的耐腐蚀性能.Based on different sputtering voltage conditions,nanometer titanium dioxide bio-film was prepared on NiTi shape memory alloy surface by the activation sputtering method.The influences of the sputtering voltage on the thickness of the film and crystal structure were studied by the step profiler and Raman spectrum.The corrosion resistance of the NiTi alloy and TiO2-coated NiTi alloy was evaluated in simulated body fluid at 37 ℃,respectively.Results showed that under the condition of this experiment the thin film was anatase structure,and the major constituent was nanometer titanium dioxide.The titanium dioxide thin films effectively improved the corrosion resistance of the NiTi alloy in simulated body fluid at 37 ℃.

关 键 词：NITI形状记忆合金 活化溅射 TIO2薄膜 溅射电压 

分 类 号：TG139[一般工业技术—材料科学与工程]