笼型聚倍半硅氧烷修饰介孔SiO_2结构的研究  

Study on structure of G-POSS modified mesoporous silica

作　　者：刘蓬[1] 焦剑[1] 蔡宇[1] 

机构地区：[1]西北工业大学理学院应用化学系,陕西西安710129

出　　处：《粘接》2013年第6期30-33,共4页Adhesion

基　　金：西北工业大学研究生创业种子基金(Z2013149)资助

摘　　要：采用合成的氨基丙基介孔SiO2(NH2-MPS)与八环氧基聚倍半硅氧烷(G-POSS)反应,借助POSS较大的尺寸对介孔SiO2进行部分的封端,制备并改性粒径均一、尺寸可控的介孔SiO2纳米粒子,形成POSS-MPS结构。采用红外(FT-IR)法、X射线衍射、N2吸附-脱附和透射电镜(TEM)等测试手段对其性2能和结构进行表征和测定,确定POSS修饰MPS的较优合成工艺。Using the reation of synthesized aminopropyl mesoporous silica （NH2-MPS） with glycidyl ether polyhedral oligomeric silsesquioxanes （G-POSS）,the MPS was partially closed with G-POSS with larger size to prepare and modify the MPS nano particles with uniform size and controllable size and form the structure of POSS-MPS.The performance and structure were Characterized and determined by FT-IR,X-ray diffraction,nitrogen adsorption-desorption and transmission electron microscopy （TEM）,and the optimal synthesis process of POSS-MPS was determined.

关 键 词：八环氧基POSS 介孔二氧化硅 结构 性能 

分 类 号：TQ430.4[化学工程]