X射线照相缺陷定位方法分析与验证  

Analysis and Verification of Locating Defects in X-ray Photographic Testing

作　　者：蔡闰生[1] 任华友[1] 

机构地区：[1]航天材料及工艺研究所,北京100076

出　　处：《宇航材料工艺》2013年第3期129-133,共5页Aerospace Materials & Technology

摘　　要：相对于公式法,双标记法解决了焦距和焦点位移测量误差所带来的问题。但此方法在射线检测领域普及程度并不高,其中原因,首先是原理较复杂,针对性研究少,其次是测量精度没有被量化,可信度不高。本文从公式法入手,通过对原理公式的变化分析和线性化分析,明晰了双标记法缺陷深度定位原理,推导了缺陷深度定位公式,利用简化模型,对双标记法的定位精度做了进一步的分析与计算,最后针对具体被检测物,测试验证了双标记法的计算公式和测量精度,用理论和实践证明了方法和精度的可靠性。Formula method and double labeling method are two positioning methods on depth of defects. Relative to the formula method, the double labeling method solves the problems brought by the measurement error of focal length and focus shift by method of double labeling. This is a method of greater practical significance. Meanwhile, this method is not wildly used in the field of ray inspection. The first reason is the principles are complicated, and tar- geted researches are less; the second reason is, the measurement accuracy cannot be quantified, the credibility is du- bious. Formula method is used in this essay. Through the analysis on change and linearization of principle formula, the essay defines the position principle on defect depth of double labeling method, derives the position formulation of defect depth. Using the reduced model, the essay do further analysis and calculation on position accuracy of double labeling method. Finally, according to the specific article to be detected, the test verified the calculation formula and the measurement accuracy, certified the reliability on method and accuracy from the point of theory and practice.

关 键 词：X射线 缺陷深度 定位精度 

分 类 号：O434.1[机械工程—光学工程]