He离子注入引起的高纯钨硬化  

Hardening of Tungsten Induced by Helium Implantation

作　　者：崔明焕[1,2] 王志光[1] 姚存峰[1] 申铁龙[1,2] 李炳生[1] 庞立龙[1] 金运范[1] 李锦钰[1] 朱亚滨[1] 孙建荣[1] 

机构地区：[1]中国科学院近代物理研究所,甘肃兰州730000 [2]中国科学院大学,北京100049

出　　处：《原子核物理评论》2013年第2期206-213,共8页Nuclear Physics Review

基　　金：国家自然科学基金资助项目(10835010;91026002;11105190);国家重点基础研究发展计划项目(973计划)(2010CB832902);国家磁约束核聚变能研究专项资助(2009GB106006)~~

摘　　要：完成了不同注量或温度下100 keV的He离子注入高纯钨的实验,并利用纳米压痕技术测量了材料的微观力学性能。所有注入样品的纳米硬度值都高于未注入样品的纳米硬度值。对于室温注入样品,随着注量的增加,样品抗弹性变形能力下降;当注量不高于5×1017ions/cm2时,钨的纳米硬度峰值随着注量的增加而增加;注量为1×1018ions/cm2的钨样品的纳米硬度峰值反而降低。高温注入样品的抗弹性变形能力优于室温注入样品的抗弹性变形能力;随着注入温度的增加,样品的平均纳米硬度值和弹性模量略有下降。分析讨论了He注入钨硬化和抗弹性形变能力降低的可能原因。Tungsten has been selected as divertor materials in fusion reactors because of its high thermal conducti- vity, high melting point, low expansion coefficient and high threshold energy for sputtering etc. The paper presents the hardening behaviour of high pure tungsten by 100 keV He＋ with different fluences from 5×10^16 ions/cm2 to 1 ×10^18 ions/cm2 at room temperature, and with fluence of 1×10^18 ions/cm2 at higher temperatures （400, 600 and 800℃）. The microscopic mechanical properties of these samples were investigated by nano-indentation technology. The results showthat all of the implanted samples harden obviously. The reason for hardening may be that defects of interstitial dislocation loops or dense helium bubbles etc induced by helium implantation obstacle the movement of dislocation. The peak nano- hardness of the samples increased with the fluences increasing when the fluence is not more than 5×10^17 ions/cm2, while the nano-hardness value of the implanted sample with the fluence of 1×10^18 ions/cm2 decreases and the nano-hardness changes little in the region of ~50 nm to 200 nm from surface. For all the implanted samples with 1×10^18 ions/cma at higher temperatures, their nano-hardness values are similar, but show a trend of decrease with increasing temperature. The reason may be the decrease of the defects＇ density during implantation at higher temperatures. In addition, the capability of resisting deformation for the implanted tungsten reduces with increasing fluence and increases a little at higher temperatures.

关 键 词：He注入 高纯钨 纳米压痕 表面硬化 

分 类 号：O341[理学—固体力学] O571.33[理学—力学]