显微镜透射光照不均匀图像校正方法  

Correction method for microscope transmittance uneven illumination images

作　　者：朱珂汉[1] 杨鸣[1,2] 蒋金涛[1] 

机构地区：[1]宁波大学信息科学与工程学院,浙江宁波315000 [2]宁波市医用光电仪器省级工程技术中心,浙江宁波315000

出　　处：《计算机应用》2013年第A01期190-192,共3页journal of Computer Applications

基　　金：浙江省教育厅科研项目(Y201121170);宁波市自然科学基金资助项目(2012A610042);宁波大学学科项目(xkl088)

摘　　要：显微镜透射光照射下数字图像的光照不均匀校正是图像处理中的一个难题。传统的掩模法和背景拟合法由于受到应用场景的限制,并且背景拟合法校正后图像亮度偏暗,具有一定的应用局限性。结合传统算法的计算量小、校正速度快的优点,提出了一种基于掩模法和背景拟合法的校正方法。该方法通过选取图像分割区域中的亮度最大值作为采样点,提高了校正后图像的整体亮度,并利用采样点的平均值来进行插值获取背景估计图,最终利用掩模法来实现图像的快速校正。通过对校正后图像的亮度均值、亮度均匀性和图像细节三个评价指标的对比,证明该方法校正速度快、效果好,能适用于显微镜的光照环境。The digital image correction of uneven illumination under microscope transmittance is a problem in image processing. Traditional mask method and background fitting method are restricted due to application scenarios, and the corrected image brightness is low by using background fitting method, so it has some limitations of the application. The traditional algorithm has advantages of low calculation and high correction speed. Combining with above characteristics, a new correction method was proposed based on the mask method and background fitting method. This method selected the maximum brightness as the sampling point in the region of the image segmentation. It improved the overall brightness of the corrected image, interpolated the average of the sampling points to obtain background estimation image, and finally completed image correction through the mask method. By contrasting three evaluation indicators of the corrected image, luminance means, luminance uniformity and image detail, this correction method is proved effective in the microscope illumination environment.

关 键 词：数字图像 不均匀光照 校正 透射光 掩模法 背景拟合法 

分 类 号：TP391.413[自动化与计算机技术—计算机应用技术] TP317.4[自动化与计算机技术—计算机科学与技术]