火法冶炼镍基体料中硅含量的测定:分光光度法与ICP-AES的比较  

Determination of Silicon in Nickel Base Material:Comparison of Two Methods-by Spectrophotometry and ICP-AES

作　　者：刘烽 王慧 徐海斌 王国新 吴骋 张维伟 吴广宇 

机构地区：[1]常熟出入境检验检疫局,江苏省常熟市海虞北路49号215500

出　　处：《光谱实验室》2013年第4期1773-1776,共4页Chinese Journal of Spectroscopy Laboratory

基　　金：火法冶炼镍基体料化学分析方法系列行业标准项目(有色标秘[2012]17号)

摘　　要：介绍了两种测定火法冶炼镍基体料中硅含量的方法:分光光度法和电感耦合等离子体-原子发射光谱法(ICP-AES)。使用硫酸和硝酸溶解样品。分光光度法采用基体匹配的方式消除铁对吸光度的影响,结果的相对标准偏差为1.3%—4.0%,加标回收率为96%—106%。电感耦合等离子体原子发射光谱法采用基体匹配的方式消除铁和镍对发射光强度的影响,结果的相对标准偏差为0.5%—2.8%,加标回收率为97%—101%。两种检测方法的结果一致,方法重复性好,准确度高,都可以满足镍基体料中硅含量的分析要求。分光光度法对仪器和环境要求较低,适于普遍推广;ICP-AES操作简单,效率高,方法的稳定性更好。The determination of silicon of nickel base material by spectrophotometry and inductively coupled plasma atomic emission spectrometry（ICP-AES） was introduced.The sample was dissolved with mixed acid of HSO4 and HNO3.The effect of matrix iron and nickel was eliminated by matrix matching method.When the samples were determined by spectrophotometry,the relative stardard deviations were 1.3%—4.0% and the recoveries were 96%—106%.When the samples were determined by inductively coupled plasma atomic emission spectrometry（ICP-AES）,the relative stardard deviations were 0.5%—2.8% and the recoveries were 97%—101%.Both of them proved to be useful technique with good repetition and accuracy.The method of spectrophotometry has lower requirement for instrument.The method of ICP-AES showed simple operation and better repetition.

关 键 词：镍基体料 分光光度法 电感耦合等离子体-原子发射光谱法 硅 

分 类 号：O657.31[理学—分析化学] O657.32[理学—化学]