焦平面红外成像设备非均匀性校正残差分析  

Analysis on Nonuniformity Residual Fixed Pattern Noise of IRFPA Imaging Device

作　　者：樊宏杰[1] 许振领[1] 杨淼淼[1] 王敏[1] 邹前进[1] 刘连伟[1] 

机构地区：[1]中国人民解放军63892部队

出　　处：《红外技术》2013年第7期409-413,共5页Infrared Technology

基　　金：装备预先研究项目

摘　　要：非均匀性是焦平面红外成像设备的固有特性,影响成像质量。介绍了非均匀性产生的原因、校正方法及校正残差的描述方法。从理论上分析计算了不同校正方法的校正残差及其变化规律。并针对某VOx非制冷热像仪实测图像数据计算了不同校正方法、不同温度下的校正残差大小,得出在使用单点校正方法测量时尽量将校正温度点选在测量对象温度(等效黑体温度)分布的中间位置及使用两点校正时校正温度尽量设置在测量对象温度区域(等效黑体温度)两侧的结论。Nonuniformity which affected imaging quality is an inherence of IRFPA. In this paper, the mechanism and method of nonuniformity correction is presented, and the residual fixed pattern noise is described. Firstly, residual fixed pattern noise is analyzed and calculated with different methods of nonuniformity correction. Finally, the calculating result is achieved based on different method and temperature in allusion to VOx IR imaging device. It shows that the calibration temperature should be chosen at midst of temperature extent of target with one-point correction method and at both sides of temperature extent of target with tow-points correction method.

关 键 词：红外成像 非均匀性 校正方法 校正残差 

分 类 号：TN215[电子电信—物理电子学]