室温沉积碳氮薄膜的成键分析  

Bonding Study of Carbon Nitride Films Deposited at Ambient Temperature

作　　者：赵敏学[1] 

机构地区：[1]中国人民武装警察部队学院科研所,河北廊坊065000

出　　处：《河北师范大学学报（自然科学版）》2000年第3期319-321,355,共4页Journal of Hebei Normal University：Natural Science

摘　　要：在前文对碳氮薄膜结构研究的基础上 ,分析了室温沉积碳氮薄膜的成键状况 .结果发现 ,氮、碳 XPS结合能之差随氮碳原子比的增加而线性地减小 ;碳、氮峰可以分解为若干个子峰 ,但与化合物 C3N4难以建立明显的联系 .红外吸收和喇曼散射显示出类似的结果 .因此 。Based on previous stuctural study,the bonding states are studied on carbon nitride films deposited at ambient temperature.The results are as follows:①the differences of XPS bonding energy between nitrogen and carbon decreased linearly with atomic ratio(N/C);② although the carbon and nitrogen peaks are resolved into several Gaussian peaks,they can not be regarded to originate from the compound C 3N 4;③the infrared absorption and Raman scattering spectra give similar results with XPS.Finally,it is proposed that the spectra of carbon nitride films should be explained carefully.

关 键 词：薄膜 碳氮化合物 成键分析 沉积 室温 检测 

分 类 号：O484.1[理学—固体物理] O484.5[理学—物理]