中阶梯光栅铝膜的纳米压入测试  

Nano-indentation Test for Aluminum Film of Echelle Grating

作　　者：石广丰[1] 徐志伟[1] 史国权[1] 蔡洪斌[1] 王磊[1] 吕杨杨[1] 

机构地区：[1]长春理工大学机电工程学院,长春130022

出　　处：《机械工程材料》2013年第7期94-97,共4页Materials For Mechanical Engineering

基　　金：国家自然科学基金资助项目(51075042);吉林省科技发展计划项目(20080534);长春理工大学青年科学基金资助项目(202/000488)

摘　　要：对槽线密度为79线.mm-1的中阶梯光栅铝膜进行了深度3μm的纳米压痕试验,并采用有限元模拟结合正交分析的方法对其进行计算和分析,得到初步优化的参数组合,最后通过迭代优化求解最优组合。结果表明:中阶梯光栅铝膜的平均弹性模量为85.7GPa,最优测试参数组合为屈服应力134MPa和应变硬化指数0.09;所建立的光栅压入测试有限元模型的计算准确性对屈服应力的输入较为敏感。The nano-indentation test with 3 μm in depth was carred out in the aluminum film of echelle grating with linear density of 79 grooves . mm-1 The initially optimized parameter combination was obtained by finite element simulation combining with orthogonal analysis and the best parameters were given by iterative optimization. Results show that the mean value of Young＇s modulus of echelle grating aluminum film was 85.7 GPa. The optimum tested parameter combination of echelle grating aluminum film was 134 MPa in yield stress and 0.09 in strain hardening exponent. The accuracy of the finite element simulation model of grating indentation was relatively sensitive to the yield stress.

关 键 词：中阶梯光栅 铝膜 纳米压痕 有限元 正交分析 

分 类 号：TH142.3[一般工业技术—材料科学与工程]