壳聚糖光敏改性及其胶束行为  被引量:1

Micellization of Photosensitive Modified Chitosan

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作  者:张皝[1] 徐云龙[1] 易成林 刘晓亚 

机构地区:[1]华东理工大学材料科学与工程学院,上海200237 [2]江南大学化学与材料工程学院,无锡214122

出  处:《胶体与聚合物》2013年第3期102-105,共4页Chinese Journal of Colloid & Polymer

基  金:国家自然科学基金(50673038);上海国际科技合作基金(08230705600)

摘  要:以醋酸水溶液为溶剂,N-甲基-4-(4-甲醛基苯乙烯)吡啶甲基硫酸盐(SBQ)为光敏单体,通过支链上氨基的Schiff碱反应对壳聚糖进行接枝改性,将改性壳聚糖溶解于丙烯酸水溶液形成胶束溶液,通过聚合丙烯酸制备了壳聚糖/PAA纳米粒子。结果表明:该改性方法能够使壳聚糖有效接枝上光敏单体SBQ,接枝率为3.1%,改性壳聚糖具备良好光敏感性;胶束粒子的粒径对紫外光有很好的光响应性。The photosensitive modified chitosan were prepared using the Schiff- reaction between the amino of the chitosan and the formyl group of N-methyl- 4-(p-formylstyryl) pyridinium methylsulfate(SBQ). The structure and photosensitivity were characterized by attenuated total reflection fourier transform infrared spectroscopy (ATR-FTIR), X-ray photoelectron spectroscopy (XPS) and Ultraviolet spectrometer (UV). The modified chitosan was dissolved in aqueous solution of acrylic acid to prepare chitosan/PAA nanoparticles through the polymerization of acrylic acid. UV and dynamic laser scattering (DLS) were used to study the optical response of colloidal particle size. The results showed that the SBQ can effectively graft onto the chain ofchitosan and the grafting rate is about 3.1%. The materials have a good photosensitivity. The micelle particle size has a well response to the UV light.

关 键 词:壳聚糖 光敏改性 胶束 光响应 

分 类 号:O648.1[理学—物理化学]

 

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