非平衡磁控溅射沉积不同成分Ti-Ni合金薄膜的伪弹性研究  

Pseudoelasticity Behavior of Ti-Ni Alloy Film Deposited Using Unbalanced Magnetron Sputtering

作　　者：徐雪波[1] 贺耀华[1,2] 贺志勇[2] 鲍明东[1] 

机构地区：[1]宁波工程学院材料工程研究所,宁波315016 [2]太原理工大学表面工程研究所,太原030000

出　　处：《表面技术》2013年第4期28-31,共4页Surface Technology

基　　金：浙江省科技厅分析测试科技计划项目(2011C37035);宁波市重点实验室开放基金项目(2007A22001)

摘　　要：应用非平衡磁控溅射离子镀方法沉积制备了五种不同成分的Ti-Ni合金薄膜,并在保护气体条件下于600℃进行了晶化退火处理。分析了薄膜的相结构,测定了薄膜的硬度和弹性模量,并利用纳米压入加载-卸载曲线分析研究了薄膜的伪弹性回复率,讨论了薄膜成分对硬度、弹性模量和伪弹性的影响规律。结果表明:富Ni薄膜的硬度、弹性模量和伪弹性均较高,但含Ni量达到一定值后,这些性能指标呈下降趋势。Five Ti-Ni shape memory alloy films with different composition were deposited using unbalanced magnetron sputter ion plating technique.As-deposited coatings were crystallized by heating to 600 ℃ at the environment of Ar insert gas.The phase transformation behavior of the fabricated film was investigated.The hardness and Young modulus of films were evaluated.The recoverable energy of films was investigated from the entire loading and unloading process that results into a load-displacement curve automatically.The effect of composition of films on hardness,elastic modulus and pseudoelasticity was discussed.Results indicated that hardness,Young＇s modulus and pseudoelasticity increased with the rising of atomic percent of Ni in films.But there was a maximum value of those mechanic properties with the increase of Ni percent.

关 键 词：形状记忆合金 薄膜 纳米压入 伪弹性 

分 类 号：TG174.444[金属学及工艺—金属表面处理]