废杂铜氨性蚀刻溶铜工艺研究  

Research on Etching of Copper From Copper Scrap

作　　者：曹洪杨[1] 王继民[1] 黄莉丽[1] 周毅舟 许维健 

机构地区：[1]广州有色金属研究院稀有金属研究所,广东广州510650 [2]广州翔骏铜业有限公司,广东广州511370

出　　处：《湿法冶金》2013年第4期234-236,共3页Hydrometallurgy of China

摘　　要：研究了在CuCl2-NH3-NH4Cl和CuCl2-CuSO4-NH3-NH4Cl体系中蚀刻废杂铜,考察了蚀刻液组成、铜氨溶液中初始离子质量浓度、温度、溶液流动状态、蚀刻液pH等因素对铜溶解速率的影响。结果表明:CuCl2-NH3-NH4Cl体系中,在铜质量浓度120～165g/L、氯质量浓度150～200g/L、pH 8.0～8.5、温度45℃、强化流动条件下,废杂铜的蚀刻速率为0.25g/(min.L);CuCl2-CuSO4-NH3-NH4Cl体系中,在铜质量浓度35～75g/L、氯质量浓度35～80g/L、pH 10.0～11.0、温度45℃、强化流动条件下,废杂铜的蚀刻速率为0.33g/(min.L)。The etching of copper from waste copper scrap in CuClz-NH3-NH4C1 and CuClz-CuSO4- NH3-NH4C1 systems has been researched. The effects of etching solution composition, initial ion concentration, temperature, flowing state and pH etching solution were investigated. The experimental results showed that the optimal conditions for etching copper in CuC12-NH3-NH4 C1 system were initial Cuz＋ concentration of 120～165 g/L and C1- concentration of 150～200 g/L, pH of 8. 0～8. 5, temperature of 45℃, the etching rate of copper was 0.25 NH4C1 systems were initial Cu2＋ concentration of 35～75 g pH 10.0～11.0,temperature 45 ℃ ,the etching rate reached g/（min · L）. And in CuCl2-CuSO4-NH3- /L and C1- concentration of 35～80 g/L, 0.33 g/（min · L）.

关 键 词：废杂铜 铜氨溶液 蚀刻 铜 

分 类 号：TF803.21[冶金工程—有色金属冶金] TF811