半导体激光气体氮化钛合金的研究  

Laser Gas Nitriding Titanium Alloy by Diode Laser

作　　者：楼程华[1] 易云杰[1] 梅林波 安春香 姚建华[1] 

机构地区：[1]浙江工业大学激光加工技术工程研究中心,浙江杭州310014 [2]上海电气电站设备有限公司,上海20024

出　　处：《电加工与模具》2013年第4期36-38,42,共4页Electromachining & Mould

摘　　要：在钛合金(TC4)表面采用激光气体氮化的方法制备TiN表面改性层,采用扫描电子显微镜、X射线能谱仪、X射线衍射仪、显微硬度计、摩擦磨损试验机分别分析了TiN表面涂层的组织形貌、相结构与成分、硬度分布、耐磨损性能及抗气蚀性能。研究结果表明,钛合金激光气体氮化后形成了厚度为840μm,均匀致密、无裂纹和孔洞等缺陷的氮化层,组成相主要有TiN和Ti。激光氮化层的显微硬度可达0.3790 HV,是基体的2.3倍。TiN modified surface layer on the substrate of titanium alloy （TC4） was carried out by laser gas nitriding. The microstructure morphologies,phase structure,composition and hardness distribution,wear properties of the coatings were studied by scanning electronic microscopy （SEM）, Energy Dispersive Spectrdmeter （EDS）, X-ray diffraction （XRD）,microhardness tester,friction-abrasion testing machine. The results show that the nitrided layer with about 840μm thickness was sufficiently dense, uniform, crack-free, and without porosity defects, the phase compositions of nitride layer mainly are TiN and Ti. Microhardness of laser gas nitrided layer is 0.3790 HV and 2.3 times of the substrate.

关 键 词：钛合金 激光气体氮化 半导体激光器 

分 类 号：TN249[电子电信—物理电子学]