Ag离子注入对Si和SiO_2表面的辐照改性  

Ag ion beam irradiation modification of Si and SiO_2 surfaces

作　　者：张政军[1] 温丰[2] 

机构地区：[1]清华大学材料科学与工程系,北京100084 [2]清华大学工程物理系,北京100084

出　　处：《清华大学学报（自然科学版）》2013年第5期699-703,共5页Journal of Tsinghua University(Science and Technology)

基　　金：国家"九七三"重点基础研究项目(2010CB731600)

摘　　要：为了研究注入Ag离子对基底的辐照改性作用,利用MEVVA源将不同剂量的Ag离子注入到Si和SiO2玻璃片中形成Ag纳米颗粒,并测试了SiO2玻璃片的光透过率谱,2种基底的光致发光谱和纳米压痕实验。注入高压为45KV,束流1mA,剂量分别为:5×1015、2×1016、4×1016、5×1016、8×1016、9×1016和1×1017ions/cm2。对SiO2玻璃的紫外可见光透射光谱分析表明在低剂量时400nm处有一吸收峰,当剂量达到1×1017时在450nm处出现伴峰。对比Ag离子注入前后Si和SiO2基底的光致发光谱后分析了Ag离子注入对基底发光性能的影响。通过纳米压痕测试表征了掺入Ag后基底的纳米硬度和弹性模量的变化。观察TEM样品得到了基底中Ag纳米颗粒的大小,形貌和分布等情况。Various doses of Si and SiO 2 were implanted into a surface using an Ag ion beam from a MEVVA source to study the irradiation modification by Ag ion implantation.The otical transmission spectra of SiO 2 glass,the photoluminescence spectra of two kinds of substrates and nanoindentation tests were performed.The high implanting voltage was 45KV with an ion flux density of 1mA and doses of 5×10 15,2×10 16,4×10 16,5×10 16,8×10 16,9×10 16,1×10 17 ions / cm 2.The optical absorption spectra indicated that there is a single absorption peak at 400nm,with another absorption peak at 450nm for doses over 1×10 17 ions / cm 2.The photoluminescence spectra of the unmodified substrates were compared with the irradiated substrates to study the effects of the Ag irradiation.The nanoindentation test indicated that the absence of Ag impacts the hardness and modulus in the two kinds of substrates.The size,patterns and distribution of the Ag nanoparticles were observed in the TEM samples.

关 键 词：金属-非金属复合材料 Ag离子注入 SI SIO2玻璃 辐照改性 

分 类 号：TB333[一般工业技术—材料科学与工程]