高纯钨制备工艺的原理及其研究现状  

Principles and the Latest Development of Preparation Processes of High Purity Tungsten

作　　者：马运柱[1] 刘业[1] 刘文胜[1] 龙路平[1] 刘书华[1] 

机构地区：[1]中南大学粉末冶金国家重点实验室,湖南长沙410083

出　　处：《稀有金属与硬质合金》2013年第4期5-9,共5页Rare Metals and Cemented Carbides

基　　金：国家自然科学基金资助项目(50774098)

摘　　要：综述了高纯钨制备工艺的原理及其研究现状,着重介绍了沉淀分离、溶剂萃取分离和离子交换分离等化学提纯方法,以及真空脱气、真空蒸馏、区域熔炼等物理提纯方法。此外,还介绍了化学气相沉积法,并指出了研究高纯钨制备的发展方向。Principles and the latest development of preparation processes of high purity tungsten are summa- rized. Both chemical purification methods and physical purification methods are emphatically reviewed, the former covers precipitation separation, solvent extraction and ion exchange, and the latter covers vacuum degassing, vacuum distillation and zone melting. Besides, chemical vapor deposition method is briefly intro- duced, and development trend of high purity tungsten preparation research is pointed out.

关 键 词：高纯钨 制备工艺 化学提纯 物理提纯 研究现状 

分 类 号：TF804[冶金工程—有色金属冶金]