温度对纳米晶镍涂层与界面结构的影响  

Effect of Temperature on Nanocrystalline Nickel Coatings and Interface’s Structure

作　　者：江山[1] 康广生[1] 

机构地区：[1]河南工业大学理学院,郑州450001

出　　处：《河南科学》2013年第7期980-983,共4页Henan Science

基　　金：河南工业大学自然科学基金项目(10XZR009)

摘　　要：在不同温度下(150～500℃)对电沉积纳米晶镍涂层与低碳钢基体进行低温扩散退火热处理.用X-ray衍射考察了退火温度对涂层微观结构的影响;利用扫描电子显微镜(SEM)的背散射电子(BSE)像及附带的能量色散谱(EDS)观察了涂层与基体界面上的相结构及扩散过渡层的形成.结果表明,涂层在300℃以上开始有较明显的晶粒长大发生,同时涂层织构发生转变.在250～500℃范围进行低温扩散退火可以有效促使纳米晶镍涂层与基体界面上原子的扩散,形成扩散过渡层,同时控制涂层晶粒不过分长大.Low temperature diffusion annealing with electrodeposited nanocrystalline nickel coatings and mild steel substrates were performed in the temperature range between 150 ℃ and 500 ℃. The influence of annealing temperature on the microstructure of Ni coatings was investigated by X-ray diffraction（XRD）. The phase structure of interface between coating and substrate and the formation of transition layer on the interface were detected by backscattered electron（BSE） images and energy dispersive X-ray spectroscopy（EDS） attached to scanning electron microscope（SEM）. The results show that an obvious grain growth and texture mutation occurred when temperature up to 300℃. Low temperature diffusion annealing between 250℃and 500℃secured effectively the atom diffusion and the formation of a transition layer on the interface. Moreover,excessive grain growth was restrained.

关 键 词：纳米晶镍涂层 低碳钢基体 界面扩散 晶粒长大 

分 类 号：TG156.2[金属学及工艺—热处理]