二硫化钨夹层化合物制备的研究  

Preparation of Research of Tungsten Disulfide Intercalation Compounds

作　　者：章文君 高乃兵 胡晓翠 

机构地区：[1]华东冶金地质勘查局,安徽合肥230088

出　　处：《广州化工》2013年第14期117-118,135,共3页GuangZhou Chemical Industry

摘　　要：二硫化钨是典型的层状过渡金属硫化物,层间为较弱的范德华力,因此可以采用特定的方法将WS2分子层打开形成单分子层纳米片,并将无机或有机的离子或基团插入层间形成夹层化合物。本文介绍了几种WS2单分子层纳米片和夹层化合物的制备方法,并对其发展前景进行了展望。Tungsten disulfide was a typically layer transition metal dichalcogenide, the weak van der Waals forces be- tween the layer, which can be used some specific methods to open the molecular layers to form WS2 monolayer nanoshe- ets, and made inorganic or organic ions or groups inserted between the layers to form intercalation compounds. Several preparations of WS2 single - layer nanosheets and intercalation compounds were described, and their development was prospected.

关 键 词：二硫化钨 单分子层纳米片 夹层化合物 

分 类 号：TG174.4[金属学及工艺—金属表面处理]