Influence of substrate surface roughness on light scattering of TiO2 optical thin films  

作　　者：Toshinori Harada Hiroshi Murotani Shigeharu Matumoto Hiromitu Honda 

机构地区：[1]Course of Electro Photo Optics, Graduate School of Engineering, Tokai University, Japan [2]Sincron Co., Ltd., Japan

出　　处：《Chinese Optics Letters》2013年第13期83-86,共4页中国光学快报（英文版）

摘　　要：Optical thin films are used in many optical elements; however, light scattering can be problematic. We investigate the effect of substrate surface roughness on the light scattering of optical thin films. The substrates are classified according to their surface roughness, from fine to very rough, and coated with a single TiO2 layer or a SiO2/TiO2 multilayer. The light scattering intensity increases as the substrate roughness increases. Scanning electron microscopy reveals that the number of nodules formed in the optical thin films increases with the substrate roughness, which affects the light scattering properties.Optical thin films are used in many optical elements; however, light scattering can be problematic. We investigate the effect of substrate surface roughness on the light scattering of optical thin films. The substrates are classified according to their surface roughness, from fine to very rough, and coated with a single TiO2 layer or a SiO2/TiO2 multilayer. The light scattering intensity increases as the substrate roughness increases. Scanning electron microscopy reveals that the number of nodules formed in the optical thin films increases with the substrate roughness, which affects the light scattering properties.

分 类 号：TN16[电子电信—物理电子学] TG84[金属学及工艺—公差测量技术]