微纳米测量机测头结构的参数设计及分析  

The Parameters Design and Analysis of Micro-nano CMM Probe

作　　者：陈贺[1] 陈晓怀[1] 王珊[1] 杨桥[1] 李瑞君[1] 

机构地区：[1]合肥工业大学仪器科学与光电工程学院,安徽合肥230009

出　　处：《计量学报》2013年第5期401-405,共5页Acta Metrologica Sinica

基　　金：国家自然科学基金（51275148）;863计划重点项（2008AA042409）

摘　　要：设计了一种高精度的接触扫描式测头，提出了4种测头弹性结构的设计方案。根据测头的测量范围、测量灵敏性、测量稳定性、各向同性的要求，选择了最优的设计结构。对选择的结构进行了参数设计、力学分析和有限元分析，分析结果表明设计的测头测量范围达到40μm×40μm×20μm，测量刚度小于0．5mN／μm，各向同性也符合设计要求。A high precision contact scanning probe is designed and four different elastic mechanism schemes were proposed. According to the requirements of measuring range, sensitive, stability and stiffness equation in every direction, optimal structures were selected. For the selected structure, the parameters design, mechanical analysis and finite element analysis were done. The analysis results show that measuring range can meet the requirement of 40μm×40μm×20μm and measuring stiffness is less than 0. 5 mN/μm, stiffness equation can meet the requirement.

关 键 词：计量学 接触扫描式测头 微纳米测量机 力学分析 弹性结构设计 

分 类 号：TB921[一般工业技术—计量学]