电感耦合等离子体原子发射光谱法测定金属硅中硼的不确定度评定  

Uncertainty Evaluation for the Determination of Boron in Silicom-Metal by Inductively Coupled Plasma Optical Emission Spectrometry

作　　者：汪正花 师存杰[2] 

机构地区：[1]青海黄河水电有限公司新能源分公司,青海西宁810008 [2]青海大学化工学院,青海西宁810016

出　　处：《广东化工》2013年第16期199-200,共2页Guangdong Chemical Industry

摘　　要：对电感耦合等离子体原子发射光谱(ICP-OES)法测金属硅中硼的不确定度来源进行了详细分析,对测定过程中的主要不确定度进行了合理的评定,包括:样品称量引入的不确定度、校准曲线引入的不确定度、容量瓶和移液管体积引入的不确定度以及测量的重复性和仪器引入的不确定度,最后合成标准不确定度乘以95%置信概率下的扩展因子2,获得测量结果的扩展不确定度,并确定了分析结果的置信区间。The sources for the uncertainty were analyzed in detail for the determination of boron in silicom-metal by inductively coupled plasma optical emission spectrometric method. The main uncertainty during the determination process was reasonably evaluated. The results showed the total uncertainty was mainly introduced by the following factors： sample mass, calibration curve, volumetric flask and burette, measurement repeatability. The expanded uncertainty was obtained by multiplying the combined standard uncertainty with the expanded factor 2 at the confidential level of 95 %. The confidence intervals of results were determined.

关 键 词：金属硅 硼 电感耦合等离子体原子发射光谱法 不确定度评定 

分 类 号：O657.3[理学—分析化学]