喷射电沉积纳米晶镍的研究  

A Study of Jet Electrodepositing Nanometer Crystalline Nickel

作　　者：熊毅[1] 荆天辅[1] 张春江 邵光杰[1] 于升学[1] 张芳[1] 张春玲[1] 

机构地区：[1]燕山大学材料科学与化学工程学院,河北秦皇岛066004

出　　处：《电镀与精饰》2000年第5期1-4,共4页Plating & Finishing

基　　金：河北省自然科学基金!资助项目 (5 982 5 0 )

摘　　要：用喷射电沉积法制备纳米晶镍 ,研究了电解液喷射速度、电流密度、沉积速度等工艺参数之间的关系 ,分析了沉积层的组织结构。结果表明 :电解液喷射速度为 2～ 5.5m/ s,电流密度在 80～ 1 60A/ dm2 之间时 ,最大沉积速度为 1 4～ 32μm/ min,沉积层外观光亮。 x-射线衍射谱观察和透射电镜的分析表明 :沉积层平均晶粒尺寸为 2 0～ 30 nm,且存在 ( 2 2 0 )结构。Nanometer crystalline nickel was prepared by jet electrodepositing. The relationship between jet speed, current density and depositing rate was studied, and microstructure of the deposit was analysized. The results show that when the jet speed of electrolyte flow varies from 2m/s to 5.5 m/s, and current density from 80 A/dm 2 to 160 A/dm 2, the depositing rate ranges from 14 μm/min to 32 μm/min, and bright apparent deposit can be achieved. The observation and analysis of the x ray diffraction and TEM indicated that there were (220) textures in the nickel deposit, the average grain size of the nickel electrodeposit is about 20～30nm.

关 键 词：喷射电沉积 纳米晶 沉积速度 镍 电流密度 

分 类 号：TQ153.12[化学工程—电化学工业] TQ138.11