化学沉积显示法在近α钛合金研究中的应用  

Chemical Deposition Decoration in the Metallography of Near-α Titanium Alloy

作　　者：毛冕卿[1] 朱玉斌[1] 王克光[1] 

机构地区：[1]西北有色金属研究院,西安710016

出　　处：《稀有金属材料与工程》2000年第4期279-282,共4页Rare Metal Materials and Engineering

摘　　要：在常规的水基腐蚀剂不能有效地显示一些近α钛合金的晶界时 ,应用化学沉积法可以真实、完整、清晰地显示它们的晶粒形态 ,并且能充分表现孪晶形貌。实验结果表明 ,两种化学沉积配方显示的金相组织在显微镜下可得到彩色金相图片 ,在黑白摄影的条件下同样可获得满意的效果。Common water base etching reagents can not effectively etch the grain boundaries of some near α titanium alloys. On the other hand, chemical deposition is able to display the grain morphologies vividly and completely. Furthermore, twinned crystal morphologies can also be revealed thoroughly using the chemical deposition technique. Based on many test results, colorful photographs of metallographic structure have been made using two ingredients of chemical deposition. The technique is also applicable to black and white photography.

关 键 词：晶界 化学沉积法 Α钛合金 金相分析 

分 类 号：TG115.211.3[金属学及工艺—物理冶金]