Fabrication of a network structure SERS substrate and the application in ultra-sensitive crystal violet detection  

Fabrication of a network structure SERS substrate and the application in ultra-sensitive crystal violet detection

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作  者:谭恩忠 殷鹏刚 郭林 

机构地区:[1]Department of Mathematics and Physics, Beijing Institute of Petrochemical Technology [2]Key Laboratory of Bio-Inspired Smart Interfacial Science and Technology of Ministry of Education, School of Chemistry and Environment, Beijing University of Aeronautics and Astronautics

出  处:《Optoelectronics Letters》2013年第5期381-384,共4页光电子快报(英文版)

基  金:supported by the National Basic Research Program of China(No.2010CB934700);the National Natural Science Foundation of China(Nos.20973019 and 50725208)

摘  要:A network structure surface-enhanced Raman scattering(SERS)-active substrate is fabricated by adding Ag sol dropwise on adhesive tape.Scanning electron microscope(SEM) is employed to characterize the structure of the as-prepared substrate.The substrate shows great SERS enhancement ability and good uniformity by using p-aminothiophenol(PATP) as probe molecules.The detection of crystal violet(CV) in aqueous solution is demonstrated,and the detection limit is as low as 10-12M with the aid of the substrate.The results indicate that the proposed method is a potential approach for the fabrication of SERS substrates.A network structure sttrface-enhanced Raman scattering (SERS)-active substrate is fabricatea oy adding Ag sol dropwise on adhesive tape. Scanning electron microscope (SEM) is employed to characterize the strucroxe of the as-prepared substrate. The substrate shows great SERS enhancement ability and good uniformity by using p-aminothiophenol (PATP) as probe molecules. The detection of crystal violet (CV) in aqueous solution is demonstrated, and the detection limit is as low as 10 12 M with the aid of the substrate. The results indicate that the proposed method is a potential approach for the fabrication of SERS substrates.

关 键 词:SERS 网络结构 结晶紫 应用程序 衬底 检测 制备 超灵敏 

分 类 号:O436.2[机械工程—光学工程]

 

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