α-C:H膜系与氮化物膜系的结构性能比较及机理分析  

Comparison on Properties and Mechanism of α-C:H Films System and Nitride Films System

作　　者：于斌斌[1] 袁军堂[1] 汪振华[1] 胡小秋[1] 王飞 

机构地区：[1]南京理工大学机械工程学院,南京210094 [2]苏州大学物理科学与技术学院,苏州215005

出　　处：《机械工程学报》2013年第16期91-99,共9页Journal of Mechanical Engineering

基　　金：国家自然科学基金(51105207);中国博士后科学基金(2011M500924);江苏省研究生创新基金(CX10B_113Z)资助项目

摘　　要：采用非平衡磁控溅射与阳极离子束技术制备Cr/α-C:H膜系,同时采用多弧离子镀技术分别制备Cr/CrNx与Ti/TiNx膜系,膜层厚度均为2μm。利用扫描电子显微镜、原子力显微镜、Raman光谱、X射线衍射仪分析三种薄膜的微观结构和表面形貌;采用WS-2005型附着力划痕仪测试三种膜系与SKD11不锈钢基体的结合强度;采用自主研制的球磨仪测试制备在SKD11不锈钢与YG6硬质合金基体上的三种膜层耐磨性能。结果表明,利用阳极离子束技术制备的α-C:H膜是一种非晶结构、表面平滑的薄膜,粗糙度值仅为5.21 nm,划痕试验临界载荷为17.8 N。而晶态的TiNx与CrNx膜层粗糙度较高,且其表面存有'熔滴',但其结合强度较高,划痕试验临界载荷达80 N以上。α-C:H膜层的耐磨性能优于TiNx,CrNx,且沉积在YG6硬质合金基体上的膜层单位磨损率均比SKD11不锈钢基体上的膜层低。Cr/α-C：H films system are prepared by unbalanced magnetron sputtering and anode ion beam technique,and Cr/CrNxand Ti/TiNxfilms systems are prepared by multi-arc ion plating technique.The thicknesses of films are 2 μm.The microstructures and the morphologies of the resulting of three films systems are investigated by scanning electron microscopy,atomic force microscopy,Raman spectroscopy and X-ray diffractometer,respectively.The mechanical and the tribological properties of the films are studied by WS-2005 scratch tester,and ball cratering tester.The results show that α-C：H films prepared by anode ion beam technique are films with non-crystal structure and smooth surface,the roughness value is only 5.21 nm,highest critical load is 17.8 N in scratch test,while the roughness value of crystal Ti/TiNx films systems are higher,and there’s droplet on the surface,but the adhesive strength of Ti/TiNx and Cr/CrNx films to the substrate are higher,and the highest critical load is up to more than 80 N in scratch test.The tribological properties of α-C：H film is better than TiNxand CrNxfilms.The unit wear rate of films to the substrate of YG6 cemented carbide is lower than the films to the substrate of SKD11 stainless steel.

关 键 词：离子束技术 α-C H膜 多弧离子镀 TIN膜 CrN膜 

分 类 号：TG174[金属学及工艺—金属表面处理]