提高毛细管放电类氖氩46.9nm软X射线激光强度的研究  

Research of enhancing the output of capillary discharge-pumped Ne-like Ar 46.9 nm soft X-ray laser

作　　者：谢耀[1] 赵永蓬[2] 王骐[2] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春130033 [2]哈尔滨工业大学可调谐激光技术国家级重点实验室光电子技术研究所,黑龙江哈尔滨150080

出　　处：《红外与激光工程》2013年第8期2036-2040,共5页Infrared and Laser Engineering

基　　金：国家自然科学基金(61078034)

摘　　要：为了提高毛细管放电类氖氩46.9 nm软X射线激光的强度,研究了工作介质中气体的掺杂对激光强度的影响。研究表明,在纯Ar中掺入适量的He显著地提高了激光的输出强度。通过对比在Ar中掺入Ne、N2以及Kr等其他气体的实验,系统地分析了He的掺入对等离子温度的影响,找到了在特定工作气压下最佳的掺杂比,有利于进一步提高毛细管放电46.9 nm软X射线激光的强度。在放电等离子体极紫外光刻(EUVL)光源研究过程中,也采用了在Xe中掺入适量He的方式以提高13.5 nm的输出强度。The observation of the capillary discharge-pumped Ne-like Ar 46.9 nm soft X-ray laser output was reported under the condition of pure Ar and gaseous mixture of M-He, Ar-Ne, Ar-N2 and Ar-Kr. Mixing Ar with an appropriate quantity of He, the laser output was enhanced evidently, and there was an optimum ratio of He in the gaseous mixture of M-He, which could be the best for laser output. The experimental results of Ar-Ne, Ar-N2 and Ar-Kr mixture show that Ne, N2 and Kr decrease the laser output. The source research of discharged produced plasma in extreme ultraviolet lithography also mixes an appropriate quantity of He, in order to enhance 13.5 nm.

关 键 词：毛细管 软X射线激光 XRD Rowland谱仪 类氖氩 

分 类 号：TN248.6[电子电信—物理电子学]