低能离子束诱导单晶硅点状纳米结构与光学性能研究  

Nanodots Pattern and Optical Properties of Monocrystalline Silicon Induced by Low Energy Ion Beam

作　　者：陈智利[1] 刘卫国[1] 

机构地区：[1]西安电子科技大学微电子学院,陕西西安710064

出　　处：《光学学报》2013年第9期237-242,共6页Acta Optica Sinica

基　　金：欧盟第七科技框架玛丽居里计划项目(247644);陕西省教育厅科学研究项目(12JK0469);广东省科技厅高新区发展引导专项(2011B010700101);西安工业大学校长基金(XAGDXJJ1002)

摘　　要：使用微波回旋共振离子源,研究了低能Ar+束在不同入射角度下对旋转单晶硅(100)表面的刻蚀效果及其光学性能。结果表明:样品旋转、离子束能量为1000eV、束流密度为265μA/cm2、刻蚀时间为60min时,在不同入射角度下,刻蚀后的样品表面可形成均匀的自组装点状结构。入射角度为0°～25°时,随着角度增加,样品表面粗糙度增大,点状结构有序性更强,光学透射率提高;继续增加入射角度,样品表面粗糙度及点状结构尺寸开始减小,光学透射率降低;增加入射角度到45$时,自组装点状结构消失,粗糙度和平均光学透射率达到最小值分别为0.83nm和55.05%;进一步增加入射角度,样品表面再次出现自组织装点状结构,表面粗糙度急剧增大,入射角度在65$时,平均光学透射率达到极大值64.59%;此后,随着离子束入射角度的增加,表面粗糙度缓慢减小,光学透射率降低。自组织结构变化是溅射粗糙化和表面弛豫机制相互作用的结果。Electron cyclotron resonance （ECR） has been employed to etch the surface of monocrystalline silicon （100） with sample rotation, etching effects and optical properties of low energy Ar^＋ beams at different ion-beam incident angles are studied. The experimental results indicate that, when ion beam energy is 1000 eV, beam current density is 265 μA/cm2 , and etching time is 60 rain with simultaneous sample rotation, well ordered self-organized nanodot patterns form on the Si surface. Within 0°～25°, if the incident angle increases, root mean square （RMS） of the roughness and optical transmittance of the sample are enhanced with the growth of self-organizing nanostructure, when surface roughen functions principally. If the incident angle remains increaseing, the reducing size of self-organized nanodots lessen RMS and optical transmittance of samples. If the incident angle continues to increase nearly up to 45°, the dot patterns fade away, and RMS and mean optical transmittance of samples reach the minimums of 0.83 nm and 55.05 %, and the polishing effect is obvious for ion beams. If the incident angle further increases, the self-organized dot patterns appear on the sample surface again, RMS is dramatically enlarged and optical transmittance start to magnify with the angle increasing, and at about 65° , the mean optical transmittance get the maximum of 64.59 %, then the RMS and optical transmittance begin to decrease slowly with the incident angle increasing. The transformation self-organized nano-structure patterns results from the interaction of spurting roughness and relaxation mechanism.

关 键 词：表面光学 微纳米制造技术 自组织纳米结构 低能离子束刻蚀 表面形貌 光学透射率 

分 类 号：O484[理学—固体物理]