氧化锆陶瓷平面零件超精密研磨实验的研究  

Experimental study on ultra-precision lapping for zirconia ceramic plane

作　　者：纪宏波[1] 彭岩[1] 周芬芬[1] 郭伟刚[1] 吕冰海[1] 

机构地区：[1]浙江工业大学超精密加工中心,浙江杭州310014

出　　处：《机电工程》2013年第9期1059-1062,1105,共5页Journal of Mechanical & Electrical Engineering

基　　金：国家自然科学基金资助项目(51175166);浙江省自然科学基金重点资助项目(LZ12E05001);浙江省自然科学基金资助项目(Y1101085)

摘　　要：针对氧化锆陶瓷平面零件的超光滑表面加工问题,将两种超精密研磨工艺应用到氧化锆零件加工中。研究了研磨液和磨料粒径对零件表面粗糙度的影响,分析了不同加工阶段的材料去除机理,同时发现工件表面孔隙的致密性会降低氧化锆零件的可加工性能,并采用了致密性更好的氧化锆材料在使用相同工艺情况下进行了实验对比。研究结果表明,采用金刚石油膏研磨加工得到了表面粗糙度为12.9 nm的超光滑表面,在"采用Al2O3研磨液,并使用SiO2作为抛光工序"的条件下,得到了表面粗糙度为6.55 nm的超光滑表面,并且在选用致密性更好材料进行加工后,得到了表面粗糙度为4.72 nm的超光滑表面。Aiming at the processing problems of extremely smooth surface of zirconia ceramic, two ultra-precision lapping processes were ap- plied to the process of zirconia ceramic. The influence of slurry and grit size was studied, and the material removal mechanism in different process phases was analyzed, and it was also found that the material＇s compactness will decline the machinability of zirconia ceramics, con- trast experiment was conducted by using more compactly zirconia ceramicl and lapped by same process. The results indicate that an extremely smooth surface with roughness 12.9 nm Ra is obtained in process lapped by diamond paste, and roughness of 6.55 nm Ra is obtained in process lapped by Al2O3 and SiO2 slurry, and a better roughness of 4.72 nm Ra is observed by using more compactly material.

关 键 词：氧化锆陶瓷 超精密研磨 表面演变 致密性 

分 类 号：TH161.1[机械工程—机械制造及自动化] TG580.6[金属学及工艺—金属切削加工及机床]