不同离子束参数诱导单晶硅纳米微结构与光学性能  

Surface topography and optical properties of monocrystalline silicon induced by low energy different ion beam parameters

作　　者：陈智利[1] 刘卫国[1] 

机构地区：[1]西安电子科技大学微电子学院,陕西西安710064

出　　处：《红外与激光工程》2013年第9期2490-2495,共6页Infrared and Laser Engineering

基　　金：国防基础科研计划(A0920110016);陕西省教育厅科学研究项目(12JK0469);欧盟第七科技框架玛丽居里计划(247644);西安工业大学校长基金(XAGDXJJ1002)

摘　　要：使用微波回旋共振离子源，研究了低能Ar＋离子束正入射时不同离子柬能量和束流密度对单晶硅（100）表面的刻蚀效果及光学性能。结果表明，当离子柬能量为1000eV，束流密度为88-310μA／cm2时，样品表面出现自组装纳米点状结构，且随着离子柬流密度增加排列紧密而有序；粗糙度呈现先减小后迅速增大的趋势，在160~A／cm2附近达到极小值；刻蚀后，近红外波段内平均透过率由53％提高到57％以上，且随着纳米自组装结构有序性的提高而增大。当束流密度为270μA／cm2，能量为500～l500eV时。样品表面出现纳米点状结构，且随着离子束能量的增加趋于密集有序；粗糙度呈现先缓慢增加，在l100ev附近达到极大值，之后粗糙度迅速下降；刻蚀后样品透过率明显提高，且平均透过率随着点状结构有序性的提高而增大；刻蚀速率与离子束能量的平方成正比。自组织纳米结构的转变是溅射粗糙化和表面驰豫机制相互作用的结果。ECR was employed to etch the surface of monocrystalline silicon （100）, etching effects and optical properties of low energy Ar~ ion beams with different ion energies and fluxes under normal ion incidence were studied. The experiment results indicate that, when ion flux density was 88-310 μA/cm2 with ion beam energy of 1 000 eV, self-organizing nano dot structure appeared on the sample surface, orderly arrangement of the micro-structure was along with the increase in ion flux density; RMS decreased until the flux density was near 160 μA/cm2, and then increased rapidly; The average transmittance of etched sample, within the range of near-infrared bands, was improved from 53% to more than 57%, which enlarged with the increase in orderliness of self-organizing nano-structure. When ion beam energy was 500-1 000 eV with ion flux density of 270 μA/cm2, the tiny nano dot structure gradually formed, which tended to be concentrated and orderly with the increase of ion beam energy. If ion energy was going up below 1 100 eV, RMS slowly increased but rapidly reduced over the number. The transmittance of etched sample was sharply improved, with the increasing orderliness of self-organizing nano-structure. Etching rate was directly proportional to the square of ion flux energy. The pattern transformation of self- organizing nano-structure results from the interaction of spurting roughening and relaxation mechanism.

关 键 词：低能离子束刻蚀 自组织纳米结构 表面形貌 表面粗糙度(RMS) 光学透过率 

分 类 号：O484[理学—固体物理]