双靶共溅射TiAl系高温耐磨薄膜制备与研究  

Research on the fabrication of Ti-Al series intermetallic films by double-target co-sputtering

作　　者：张晔[1] 殷春云[1] 李长生[1] 

机构地区：[1]常州机电职业技术学院模具技术系,江苏常州213164

出　　处：《真空》2013年第5期21-24,共4页Vacuum

摘　　要：在同一次双靶共溅射过程中,通过改变基体相对于靶材的位置制备了不同化学成份TiAl系金属间化合物薄膜。采用EDS、XRD、SEM、AFM等手段对薄膜的成分、物相结构和表面形貌进行了表征,并对薄膜的高温摩擦行为进行了分析研究。实验结果表明:薄膜的化学成分、物相结构、表面形貌都随着溅射位置的改变而发生变化,500℃以下时位于双靶中间位置的薄膜具有体系中最佳的性能。During a single process,a series of Ti-Al intermetallic films with different chemical composition were fabricated by double-target magnetron co-sputtering through changing the relative position between substrate and target.Composition,microstructure and surface morphology of the films were tested by EDS,XRD,SEM and AFM.Also,the friction behavior under high temperature of the films was researched.The results indicated that the chemical composition,microstructure and surface morphology of the films change with the sputtering position and the films prepared in middle position below 500℃possess the best performance.

关 键 词：双靶共溅射 金属间化合物薄膜 物相结构 高温摩擦行为 

分 类 号：TH117.43[机械工程—机械设计及理论]