Photo-Fenton高级氧化技术处理土霉素废水的研究  

Degradation of Oxytetracycline Wastewater Using Photo-Fenton Advanced Oxidation Technology

作　　者：苟世霞[1,2] 王春荣[1] 于晓华[2] 田盛 马友千 

机构地区：[1]中国矿业大学(北京)化学与环境工程学院,北京100083 [2]北京交通大学土木与建筑工程学院,北京100044 [3]哈尔滨辰能工大环保科技股份有限公司,黑龙江哈尔滨150078

出　　处：《甘肃科学学报》2013年第3期43-46,共4页Journal of Gansu Sciences

基　　金：国家自然科学基金项目(51078023);北京市自然科学基金(8122033);内蒙古科技厅科学引导基金(2010)

摘　　要：以内蒙某土霉素制药厂的二级出水为研究对象(CODcr约为400mg/L),采用UV254/Fenton高级氧化技术对其进行深度处理.研究了光强、pH值、H2O2的投加量以及H2O2与Fe2+的摩尔比值对CODcr去除率的影响.结果表明:处理土霉素废水的最佳条件是光强为850μw/cm2,废水初始pH为3,H2O2与Fe2+的摩尔比值为1∶1,H2O2的投加量为400mg/L,反应时间为60min,此时CODcr为113.6mg/L,去除率为71.6%.The oxytetracycline wastewater of a pharmaceutical industry in the Inner Mongolia was studied and treated（CODcr approximately 400mg/L）by UV254/Fenton Advanced Oxidation technology.The effect of light intensity,the pH value,the ratio of H2 O2 /Fe2＋,the concentration of H2 O2 and the reaction time on CODcr removal rate were investigated.The results showed that：the best conditions for treatment was the light intensity was 850μw/cm2,the pH value was 3,the ratio of H2 O2 /Fe2＋was 1∶1,the concentration of H2 O2 was 400mg/L and the reaction time was 60mins,and at that time the CODcr was 113.6mg/L,the removal rate was 71.6%.

关 键 词：土霉素废水 FENTON试剂 UV254 

分 类 号：X703.1[环境科学与工程—环境工程]