光氧化法制备全氟聚醚酸工艺研究  被引量:5

Research on the Preparation Process of Perfluoropolyether Acid by Photooxidation

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作  者:张鸣 陈立义 张建新 刘斌 李斌 尹忠 杨旭仓 彭孝凤 

机构地区:[1]中昊晨光化工院有限公司,四川自贡643201

出  处:《化工生产与技术》2013年第4期13-15,6,共3页Chemical Production and Technology

摘  要:以四氟乙烯为原料,通过紫外光引发,氧气氧化并聚合制备全氟聚醚化合物,然后经过KOH水溶液中和、分解过氧化物、酸析、精馏得到全氟聚醚酸,分析了光氧化制备全氟聚醚化合物的工艺条件和参数对收率和化合物组分分布的影响,检测了全氟聚醚酸的主要性质。结果表明,选择-40℃光化反应温度,紫外灯功率50 W、紫外光波长254 nm,精馏压力-98 kPa,并加入少量的CF2O,可以将主要产物相对分子质量控制在2 000以下,并保持较高的TFE转化率;在加热至100℃和150 W、254 nm紫外灯照射条件下,分解过氧化物得到稳定的全氟聚醚酸;所得全氟聚醚酸具有较低的粘度,其铵盐水溶液表面张力可以降低至17~18 nm/m2,具有很好的表面性能。Perfluoropolyether compounds were prepared by tetrafluoroethylene through UV-light initiating, oxygen oxidation and polymerization. Perfluoropolyether compounds were neutralized by KOH aqueous and decomposed peroxides, then was acided out and rectified to get perfluoropolyether acids(PFPE acids). This article analyzed the influence of condition process and parameters of photooxidation to perfluoropolyether compounds on the yield and distribution of products. Main properties of perfluoropolyether acids were detected. The results showed that the photochemical reaction temperature was-40 ℃, the uv lamp power was 50 W, the uv wavelength was 254 nm, the distillation pressure was-98 kPa, and then the small amount CF2O adding could control the relative molecular quality of main product under 2 000, and keep high TFE conversion;Under conditions of heating to 100 ℃, 150 W and 254nm uv light, peroxide was decomposed to get stable perfluoropolyether acid; The perfluorinated polyether acid had lower viscosity, the surface tension of which ammonium salt aqueous solution could be reduced to 17~18 nm/m2, which had very good surface properties.

关 键 词:全氟聚醚酸 光氧化 表面张力 

分 类 号:TQ326.5[化学工程—合成树脂塑料工业]

 

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