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机构地区:[1]东华大学化学化工与生物工程学院,上海201620 [2]纺织面料技术教育部重点实验室,上海201620
出 处:《印染》2013年第19期5-8,24,共5页China Dyeing and Finishing
基 金:上海市教委基金
摘 要:以硫化钠为模板剂,利用回流合成法制备Ag掺杂型光催化剂Ag/BiVO4;采用SEM、XRD、XPS、UVVis DRS对产物结构进行表征;以C.I.活性蓝19(RB-19)为降解物,研究其光催化性能和降解机理。结果表明:Ag/BiVO4较相同方法制备的BiVO4的光催化性能有较大的提升,在可见光条件下照射1 h,对25 mg/L的C.I.活性蓝RB-19的降解率即可达到86%。Ag-dopped BiVO4 photocatalysts (Ag/BiVO4) are prepared by refluxing synthesis method using Na2S as a template. The structure of the product is characterized by scanning electron microscope, X-ray diffraction, X-ray photoelectron spectro- scope and UV-Vis diffusion reflectance spectra. The photocatalytic performance and mechanism of the photocatalysts are stud- ied using C.I. Reactive Blue 19 [ RB-19) as the degraded material. The results show that the Ag/BiVO4 photocatalysts exhibit enhanced photocatalytic activities compared with BiVO4. The degradation rate of RB-19 solution (25 rag/L) is up to 86% after visible light irradiation for 1 h.
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