钼表面(Mo,W)Si_2-Si_3N_4复合涂层的低温氧化行为研究  

Low Temperature Oxidation Behaviors of(Mo,W) Si_2-Si_3N_4 Coating on the Molybdenum Substrate

作　　者：张厚安[1] 吴艺辉[1] 古思勇[1] 林佳[1] 庄树新[1] 

机构地区：[1]厦门理工学院材料科学与工程学院,福建厦门361024

出　　处：《厦门理工学院学报》2013年第3期1-4,共4页Journal of Xiamen University of Technology

基　　金：国家自然科学基金项目(51071133;51371155)

摘　　要：采用包渗法在钼表面原位制备了(Mo,W)Si2-Si3N4复合涂层,考察了其在大气中于500℃和600℃等温循环的氧化性能,利用XRD和SEM等研究了其组织形貌.结果表明:(Mo,W)Si2-Si3N4涂层具有良好的低温抗氧化性,其在空气中500℃和600℃氧化480 h的氧化速率分别为0.0145 g/(m2·h)和0.0191 g/(m2·h),归因于涂层氧化表面形成了致密的SiO2膜.（Mo, W）Si2-Si3N4 coating on the surface of molybdenum substrate was produced by pack cementation method. The low temperature oxidation ability of （ Mo, W） Si2 -Si3N4 coating was studied by isothermal and cyclic oxidation test at 500 ℃ and 600 ℃ in air, and it＇s microstructures were analyzed by SEM and XRD. Results show that （ Mo, W） Si^-Si3N4 coating has good anti-oxidation property at 500 9C and 600 ℃ in air, the oxidation rates of which are 0. 014 5 g/（ m2. h） and 0. 019 1 g/（ m2· h） after oxidized for 480 h respectively. This is attributed to a dense SiO2 film formed on the surface of （ Mo, W） Si2 -Si3N4 coating on molybdenum substrate.

关 键 词：(Mo W)Si2-Si3N4涂层 钼 低温氧化 

分 类 号：TG174.44[金属学及工艺—金属表面处理]