PI/AlO(OH)-SiO_2纳米杂化薄膜的制备及电性能分析  

Process of Preparing Polyimide/AlO(OH)-SiO_2 Films and Study on Electrical Properties of the Films

作　　者：赵斯梅[1] 

机构地区：[1]盐城纺织职业技术学院轻化工程系,江苏省盐城市职教园区224005

出　　处：《光谱实验室》2013年第6期2759-2762,共4页Chinese Journal of Spectroscopy Laboratory

基　　金：国家自然科学基金重点项目(50137010);国家自然科学资助项目(50373008)

摘　　要：以聚酰亚胺作为高聚物反应基体,通过正硅酸乙酯(TEOS)和异丙醇铝的水解缩合反应,使之和聚酰亚胺发生溶胶凝胶反应,从而制备出A lO(OH)/SiO2不同比例的聚酰亚胺杂化薄膜。通过利用原子力显微镜,傅里叶红外光谱和介电谱对其表观形貌和电性能进行表征和测试,考察结构与性能之间的关系。In this paper, using polyimide as the matrix resin,polyimide composite films with a varied proportion of A10 （OH）-SiOz was prepared,by the sol-gel process oftraethoxysilane （TEOS） and heteropropyl-aluminium. The surface morphology and chemical structure of the film were characterized by Atomic Force Microscope（AFM）,Fourier Transform Infrared Spectroscope （FTIR） and dielectric spectroscope and so on. And searched for the relation between the structures and the properties of the films.

关 键 词：聚酰亚胺 硅氧铝溶胶 结构 电性能 

分 类 号：O484.4[理学—固体物理] O657.6[理学—物理]