钒掺杂镁基微弧氧化膜的制备及电化学与光学性能  

Preparation, Electrochemical and Optical Properties of Vanadium-Doped Microarc Oxidation Films on a Magnesium Substrate

作　　者：李均明[1] 张骞文[1] 蔡辉[2] 王爱娟[1] 刘林涛[1] 

机构地区：[1]西安理工大学,陕西西安710048 [2]西安科技大学,陕西西安710054

出　　处：《稀有金属材料与工程》2013年第10期2083-2087,共5页Rare Metal Materials and Engineering

基　　金：国家国际合作研究项目(2007DFB50150)

摘　　要：采用向溶液添加少量偏钒酸铵的方法在镁基表面制备出了钒掺杂微弧氧化膜,有效调控了膜层的电化学与光学性能。结果表明:膜层中钒的掺杂量约为8.5 at%,部分钒元素形成了V2O3。钒掺杂后膜层的孔隙结构发生变化,厚度与硬度基本保持稳定。极化曲线测试表明,钒掺杂膜层的腐蚀电位显著正移,腐蚀电流明显降低,分别由掺杂前的–1.208 V和0.825×10-3A/cm2变为掺杂后的–0.037 V和0.3837×10-4A/cm2。UV-Vis反射光谱分析发现,钒掺杂后膜层的反射率大幅度降低,且在可见光区此现象尤为显著。Vanadium-doped microarc oxidation （MAO） films were prepared on a magnesium substrate by adding a small quantity of ammonium metavanadate into MAO solutions to control the electrochemical and optical properties of the films.The results indicate that the doping content of vanadium in the film is about 8.5at％,and some of vanadium forms V2O3.The porous structures of doped and undoped films are notably different,but similar thickness and hardness are demonstrated.The polarization curve test reveals that the corrosion potential of the doped film obviously rises,but the corrosion current remarkably decreases,whose values change from-1.208 V and 0.825× 103 A/cm2 without doping to-0.037 V and 0.3837× 10-4 A/cm2 with doping,respectively.The UV-Vis spectra indicate that vanadium-doping can weaken the reflectance,and a significant decrease is especially observed in the range of visible light.

关 键 词：微弧氧化 镁合金 钒掺杂 极化曲线 反射光谱 

分 类 号：TG174.4[金属学及工艺—金属表面处理]