扫描控制器能量均匀性设计与研究  

Improvement of Scanner Control Unit for Optical Coating Reactor

作　　者：赵兴龙[1] 

机构地区：[1]宁夏师范学院物理与信息技术学院,固原756000

出　　处：《真空科学与技术学报》2013年第10期1047-1050,共4页Chinese Journal of Vacuum Science and Technology

摘　　要：论述了应用于真空光学镀膜机的扫描控制器发展水平和现状。从理论角度出发,阐明扫描控制器的工作过程。以实际仪器仪表软硬件设计开发为基础,结合相互垂直的扫描线圈实现圆形,矩形和线形磁场分布。针对扫描负载(扫描线圈)出现的不一致的问题,以调节电子束偏转速度和控制区域圈层之间距离的方式增加软件可调参数,以电磁场对永磁场进行修正补偿,从而提高磁场能量分布的均匀性,避免电子束蒸镀面的过度集中,改善电子束蒸发源的整体性能。同时,本文设计了磁场能量分布软件,建立友好的交互界面,方便用户调解。本文最后比较能量调节前后样品蒸镀状态不同。The automatically-controlled spatial energy distributions of the electron beam, used to evaporate materials in the lab-bulit, optical film reactor, were physically modeled, empirically approximated, and numerically calculated to improve the unifmmity of the energy distribution of the electron beam. The dedicated software was developed based on the calculated results, to improve the control precision by compensating the magnetic field with the electric field, to significandy better the uniformity of the spatial energy distribution of the electron beam, and to avoid over-evaporating some spots of the source. The test results show that without modification of the hardware of the control unit, the newly-developed control software considerably improves the uniformity, compactness, and flatness of the optical thin films, deposited by electron beam evaporation.

关 键 词：扫描 能量场 磁场 均匀性 电子束 

分 类 号：TH86[机械工程—仪器科学与技术]