Engineering localized hotspot both in transversal and longitudinal direction by plasmonic coupling between nano-particles and reflective metallic film  

Engineering localized hotspot both in transversal and longitudinal direction by plasmonic coupling between nano-particles and reflective metallic film

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作  者:周杰 张静 王长涛 赵泽宇 何家玉 陶兴 罗先刚 

机构地区:[1]State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Science, Chengdu 610209, China

出  处:《Chinese Optics Letters》2013年第14期106-109,共4页中国光学快报(英文版)

基  金:This work was supported by the National "973" Program of China (No. 2011CB301800) and the National Natural Science Foundation of China (No. 61138002).

摘  要:A structure which consists of photoresist film sandwiched by Ag nano-particle and metal film is proposed to modify localized hotspot both in transversal and longitudinal direction. It shows that there is strong plasmonic coupling between Ag nano-particle and metallic surface, which helps to reduce the width and elongate the depth of the plasmonic hotspot localized inside photoresist film. And that fringes and side lobes around hotspots can be effective attenuated by bottom-side illumination. Influences of illumination, particles inter-space, and polarization are also studied. The method opens avenue for the potential applications such as lithography, optical storage, etc.A structure which consists of photoresist film sandwiched by Ag nano-particle and metal film is proposed to modify localized hotspot both in transversal and longitudinal direction. It shows that there is strong plasmonic coupling between Ag nano-particle and metallic surface, which helps to reduce the width and elongate the depth of the plasmonic hotspot localized inside photoresist film. And that fringes and side lobes around hotspots can be effective attenuated by bottom-side illumination. Influences of illumination, particles inter-space, and polarization are also studied. The method opens avenue for the potential applications such as lithography, optical storage, etc.

分 类 号:O484.1[理学—固体物理] TB383[理学—物理]

 

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