Enhanced Kerr nonlinearity in a left-handed three-level atomic system driven by a bichromatic field  

作　　者：杨晓雨 姜永远 

机构地区：[1]Department of Physics, Harbin Institute of Technology [2]Key Lab of Micro-Optics and Photonic Technology of Heilongjiang Province

出　　处：《Chinese Physics B》2013年第11期304-310,共7页中国物理B（英文版）

基　　金：Project supported by the National Natural Science Foundation of China(Grant Nos.50836002 and 51176041);the National Basic Research Program of China(Grant No.2013CB328702)

摘　　要：China） Enhanced Kerr nonlinearity in a left-handed atomic system consisting of three levels driven by a bichromatic field is presented in this paper. Based on bichromatic field coherence, the real parts of the permittivity and permeability can obtain negative values simultaneously in the same detuning frequency region. By adjusting the frequency difference and the Rabi frequencies of the bichromatic field, the multi-band left-handed behavior of the presented atomic metamaterial is exhibited. Meanwhile, the enhanced Kerr nonlinearity can be realized in this multi-band left-handed three-level atomic system. It is shown that the third-order susceptibility possesses focusing or defocusing properties in the same frequency band.China） Enhanced Kerr nonlinearity in a left-handed atomic system consisting of three levels driven by a bichromatic field is presented in this paper. Based on bichromatic field coherence, the real parts of the permittivity and permeability can obtain negative values simultaneously in the same detuning frequency region. By adjusting the frequency difference and the Rabi frequencies of the bichromatic field, the multi-band left-handed behavior of the presented atomic metamaterial is exhibited. Meanwhile, the enhanced Kerr nonlinearity can be realized in this multi-band left-handed three-level atomic system. It is shown that the third-order susceptibility possesses focusing or defocusing properties in the same frequency band.

关 键 词：LEFT-HANDED Kerr nonlinearity bichromatic field MULTI-BAND 

分 类 号：O431.2[机械工程—光学工程] O562[理学—光学]