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机构地区:[1]中国科学院长春应用化学研究所,长春130022
出 处:《分析化学》1991年第10期1158-1161,共4页Chinese Journal of Analytical Chemistry
摘 要:本文提出了用 ICP-AES 直接同时测定高纯氧化钪中15个痕量稀士元素的新方法。用PGS-2光栅光谱仪,Plasma Therm ICP-5000D 光源系统,乙醇预去溶进样方式,直接同时测定纯度为99.995%的高纯氧化钪中15个痕量稀土杂质元素,并讨论了稀土元素间的干扰及某些元素的光谱干扰的校正。当样品溶液中稀土总浓度为5mg/ml:时,测定下限为镧、钆、钬和铥0.0002%,镨、钕、铽和镥0.0004%,铕、镝、铒和钇0.0001%、镱0.00004%,铈和钐0.001%。其相对标准偏差为1.7~8.2%。Inductively eoupled plasma-atomic emission spectrometry was applied succe- ssfully to the direct simultaneous determination of 15 rare earth impurities in high purity Se_2O_3.The sample solutinos containing ethanol was introduced into the plasma with desol- vation.The calculation and correction for spectral interferences in ICP-AES have been described.For the sample solution containing 5 me/ml of Sc_2O_3,determination limits were 0.0002% for La_2O_3,Gd_2O_3,Ho_2O_3 and Tm_2O_3,0.0004% for Pr_6O_(11),Nd_2O_3,Tb_4O_7 and Lu_2O_3,0,001% for Eu_2O_3,Dy_2O_3,Er_2O_3 and Y_2O_3,0.0004% for Yb_2O_3,0.0001% for CoO_2 and Sm_2O_3.
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