溅射法快速沉积YBCO超导薄膜的研究  

STUDY OF YBCO THIN SUPERCONDUCTING FILM PREPARED BY RAPID SPUTTERING METHOD

作　　者：朱昌伟[1] 熊杰[1] 陶伯万[1] 赵晓辉[1] 张飞[1] 夏玉东[1] 薛炎[1] 郭培[1] 

机构地区：[1]电子科技大学电子薄膜与集成器件国家重点实验室,成都610054

出　　处：《低温物理学报》2013年第6期455-459,共5页Low Temperature Physical Letters

摘　　要：溅射法制备高温超导YBa2Cu3O7-δ(YBCO)薄膜材料目前存在的主要问题是沉积速率慢,制备效率低,大面积薄膜均匀性差.本文中,设计了多工位盒型靶直流溅射镀膜系统,提高了YBCO薄膜沉积速率和制备效率,一次工艺流程可沉积六片产品,总薄膜沉积速率最高可到250nm/h.基片自转与公转相结合,提高了薄膜的面内均匀性,同时研究了公转速度与自转速度的关系以及它们对薄膜生长的关系,发现只有在基片公转速度合适的情况下才能生长出性能好的薄膜.LaAlO3(LAO)单晶基片上YBCO薄膜临界电流密度超过2.8MA/cm2(77K,500nm,0T),薄膜微波表面电阻Rs(10GHz,77K)﹤0.2mΩ,1.8英寸内薄膜面内厚度起伏小于3%,双面薄膜一致性好,能够满足微波器件应用的要求.The method of Sputtering to get YBa2 Cua O7-δ （YBCO） superconducting film material is now facing tre- mendous challenges such as low deposition rate, low production efficiency and bad uniformity in large area. In this paper, the multi-position box-type target direct current-sputtering system is designed to improve the deposition rate and efficiency of YBCO thin film, which could produce six products for one run and the total YBCO film deposition rate can be up to 250nm per hour. Through studied the relationship between the quality and the rotation rate, high quality 2-inch YtK20 films on LaALOa （LAO） substrates were successfully achieved with the critical current density of more than 2. 8MA/cm^2 （77K,500nm,0T）, and the microwave surface resistance Rs of the film of less than 0. 2mΩ（10GHz,77 K）.

关 键 词：溅射 快速制备 高均匀性 YBCO 微波器件 

分 类 号：O511[理学—低温物理] O484.1[理学—物理]