电流密度对电沉积锰结构及性能的影响  

Effects of Current Density on Structure and Properties of Manganese Coating

作　　者：瞿澄[1] 朱承飞[1] 袁菊[2] 姚力军[2] 

机构地区：[1]南京工业大学材料科学与工程学院,江苏南京210009 [2]南京工业大学高技术研究院,江苏南京210009

出　　处：《电镀与精饰》2013年第11期1-4,共4页Plating & Finishing

摘　　要：锰被广泛应用于钢材中,研究制备高质量的金属锰具有很重要的现实意义。采用石墨阳极,无硒硫氨酸盐电解液,在不锈钢表面电沉积金属锰,采用恒电流法研究了电流密度对电流效率以及镀层厚度的影响。利用X-射线衍射仪测试镀层结构,扫描电镜观察镀层表面形貌,维氏硬度计测试镀层硬度。结果表明,Jκ为14A/dm2时η达到57.63%,镀层δ为37.07μm,硬度为509.53HV,获得表面形貌和晶体结构较优的金属锰。Manganese was widely used in steels,so the preparation of manganese with high quality had an important practical significance.In this paper,the metallic manganese was electrodeposited on stainless steel by using graphite as anode material and sulfate without selenium as electrolyte.And influences of current density on current efficiency and plating thickness of manganese coating were investigated.The surface morphology,crystal structure and microhardness of manganese coating were observed and determined by SEM,Vickers hardness tester and XRD.The results showed that the optimum current density for manganese plating was 14A/dm2,under which the manganese coating with a current efficiency of 57.63％,plating thickness of 37.07 μm and microhardness of 509.53 HV had a fine crystalline grain and a uniform and compact morphology.

关 键 词：电沉积锰 电流密度 电流效率 镀层结构 

分 类 号：TQ153.19[化学工程—电化学工业]