X射线荧光光谱法对玻璃上膜层厚度及成分含量的测定  

Determination of Film Thickness,Component and Content Based on Glass Surface by Using XRF Spectrometry

作　　者：梅燕[1] 马密霞[2] 聂祚仁[1] 

机构地区：[1]北京工业大学材料科学与工程学院,北京100124 [2]北京联合大学特殊教育学院,北京100075

出　　处：《光谱学与光谱分析》2013年第12期3408-3410,共3页Spectroscopy and Spectral Analysis

基　　金：国家(863)计划项目(2010AA03A407);北京市教委项目(PXM2012_014204_00_000160)资助

摘　　要：提出用X射线荧光光谱法测定浮法玻璃上镀层厚度及其各层成分含量的分析研究,对样品各层元素的测定条件、仪器工作条件等进行了设置调整,以期对每个元素的测定效果达到最佳。建立了膜层试样的背景基本参数(BGFP)法,测定结果与实际制备条件吻合,适用于生产应用。Film thickness, component and content based on glass surface were determined by using XRF technic, measure condi- tion and instrument work condition in every layer were set and adjusted for the best measure effect for every element. Back ground fundamental parameter （BG-FP） method was built up. Measure results with this method were consistent with the actual preparation course and the method could fit to production application.

关 键 词：X射线荧光光谱法 浮法玻璃 膜层厚度 成分含量 

分 类 号：O643.3[理学—物理化学] O657.3[理学—化学]