β- Ni_3Nb相单个平移畴界的相干电子微衍射研究  

The micro-diffraction study of translation domain boundary in β-Ni_3Nb phase

作　　者：潘华勇[1,2,3] 李树有[1] 朱静[1,3] 杜奎[4] 王元明[4] 贺连龙[4] 叶恒强[4] 

机构地区：[1]清华大学材料科学工程学院电子显微实验室 [2]中国科学院金属研究所固体原子像实验室,沈阳110015 [3]钢铁研究总院十三室,北京100081 [4]中国科学院金属研究所固体原子像实验室

出　　处：《电子显微学报》2000年第5期699-703,共5页Journal of Chinese Electron Microscopy Society

基　　金：国家自然科学基金资助项目

摘　　要：本文采用 HF- 2 0 0 0 FEG电镜对 Zhang等[7] 已经用 HR- TEM高分辨技术研究的 β- Ni3 Nb相的几种单个平移畴界进行了相干电子微衍射研究 ,不但对已发现 R1=[1/ 2 ,0 ,0 ]和 R2 =1/ 4 [10 2 ]型平移畴界进行了微衍射分析 ,而且发现了 R5=[1/ 4 ,1/ 2 ,0 .The micro-diffraction from a single translation domain boundary (TDB) in β-Ni 3Nb phase was taken by HF-2000 FEG TEM microscope. The R 1=1/2[001] and R 2=1/4[102] type translation domain boundary (TDB), which were stu died by us ing HR-TEM, have been studied by coherent electron micro-diffraction. While R 5=[ 1/4,1/2,0.81] type TDB, which were not found by using HREM image, have been fou nd by using micro-diffraction.

关 键 词：相干电子微衍射 单个平移畴界 镍基合金 沉淀相 

分 类 号：TG115[金属学及工艺—物理冶金]