软X射线投影光刻技术  

Soft X-ray Projection Lithography Technology

作　　者：金春水[1] 王占山 曹健林[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,应用光学国家重点实验室,长春130022

出　　处：《强激光与粒子束》2000年第5期559-564,共6页High Power Laser and Particle Beams

基　　金：国家自然科学基金资助课题!( 6962 5 710 )

摘　　要：软 X射线投影光刻作为特征线宽小于 0 .1μm的集成电路制造技术 ,倍受日美两个集成电路制造设备生产大国重视。随着用于软 X射线投影光刻的无污染激光等离子体光源、高分辨率大视场投影光学系统、无应力光学装调工艺、深亚纳米级镜面加工和多层膜制备、低缺陷反射式掩模、表面成像光刻胶。Soft X-ray projection lithography is expected as a candidate for VLSI p roduction in the near future. Based on such background, soft X-ray projection lithography (SXPL) technology i s being extensively studied in several countries, especially in Japan and USA, which are the main offers of mic roelectronic integrated circuits and its fabrication facilities. Those researches have made important progress in the major areas of SXPL, like debris free laser produced plasma source, design of high resolution and large fi eld projection system, super precision mirror/substrate polishing and coating, low defect reflective masks, s urface-imaging resist, and super fine scan stage, etc. Along the same thought, therefore, the authors and their c olleagues have concentrated in SXPL researches in the recent years, and obtained a series of results.

关 键 词：软X射线 投影光剂 集成电路 

分 类 号：TN405.98[电子电信—微电子学与固体电子学] O434.1[机械工程—光学工程]