硅硼比对无毒低温透明釉上彩颜料熔剂显微结构的影响  

Effects of Silia-to-Boric Ratios on Microstructure of Nontoxic Low Temperature Transparent Ceramic On-glaze Flux

作　　者：卢希龙[1] 陈云霞[1] 曹春娥[1] 苗立峰[1] 余峰[1] 

机构地区：[1]景德镇陶瓷学院,景德镇333001

出　　处：《中国陶瓷》2013年第12期55-57,61,共4页China Ceramics

基　　金：国家自然科学基金(51162016)

摘　　要：采用TEM、ED及XRD等分析方法，研究了不同n（SiO2）／n（B2O3）对无毒低温透明熔剂显微结构的影响。结果表明：彩烤后的熔剂产生分相现象；当n（SiO2）／n（B2O3）比处于1及2．5时，熔剂分相不明显；在1．4～2．2时分相明显，硅硼比为2．0时最为显著。高温下熔融后淬冷和自然冷却的熔剂看不到分相，熔剂中析出的是六方晶系的石英晶体，高分辨晶格条纹像表明其裸露出来的是低指数晶面（101）。Effects of various n（SiO2）/n（B203） ratios on microstructure of nontoxic low temperature ceramic on-glaze flux were investigated by means of TEM, ED and XRD. The resuIts indicated that phase separation process was observed in the flux after decoration firing. No apparent phase separation can be identified after decoration firing when n（SiO2）/n（B2O3） ratio is 1.0 and 2.5. Apparent phase separation can be observed after decoration firing when n（SiO2）/n（B2O3） ratio lies between 1.4-2.2, especially when n（SiO2）/n（B2O3） ratio is 2.0, there is much intensive phase separation. No phase separation can be found in flux after quenching or natural cooling from high temperature. Hexagonal quartz crystallized in the flux after quenching. High resolution lattice fringe images showed that the exposed crystal faces are low-index faces of （101）.

关 键 词：硅硼比 透明熔剂 显微结构 无毒低温 釉上彩颜料 

分 类 号：TQ174.45[化学工程—陶瓷工业]