氧化石墨烯薄膜的自组装制备与伽玛射线辐照还原  

Graphene oxide membrane self-assembly and reduction induced by gamma-ray irradiation

作　　者：孙宝骏 吴凡[1,2] 许广昀[1,2] 陈磊[1,2] 徐志伟[1,2] 赵亚娣[1,2] 王航[1,2] 张斌[1,2] 

机构地区：[1]天津工业大学纺织学部先进纺织复合材料教育部重点实验室 [2]天津工业大学,天津300387

出　　处：《辐射研究与辐射工艺学报》2013年第6期24-29,共6页Journal of Radiation Research and Radiation Processing

基　　金：国家自然科学基金(11175130);中国博士后基金(2012M520578);国家级大学生创新创业训练计划项目(201210058034)资助

摘　　要：通过改进的水浴自组装技术,制备出由氧化石墨烯纳米片组成的氧化石墨烯(Graphene oxide,GO)薄膜,对该薄膜进行γ射线辐照后采用扫描电子显微镜(SEM)、X射线衍射光谱(XRD)对辐照前后的薄膜进行表征,分析辐照对GO薄膜的改性作用。结果表明,辐照后GO薄膜的层间距由0.94 nm减小到0.80 nm,薄膜中GO纳米片的平均厚度从1.69 nm减小到0.86 nm,证明了γ射线对GO薄膜良好的还原效应,使GO纳米片的层间官能团减少并导致了层间距和厚度减小。本文还探讨了γ射线辐照对GO薄膜的还原机理。Graphene oxide （GO） membrane composed by GO nanosheets was obtained successfully using an improved self-assembling bathing method. The structures and the properties of as-prepared membranes were modified by y-ray irradiation. To evaluate the modification mechanisms, the pristine and irradiated membranes were characterized by scanning electron microscopy （SEM） and X-ray diffraction （XRD）, respectively. The results show that the interlayer spacing decrease from 0.94 nm to 0.80 nm and the mean thickness of GO nanosheets decrease from 1.69 nm to 0.86 nm after irradiation, which confirms that GO membrane can be reduced by y-rays with the reduction of functional groups and decrease of interlayer distance. The deoxidization mechanism of y-ray irradiation acting on GO membrane was also studied.

关 键 词：氧化石墨烯 薄膜 γ 射线辐照 还原 

分 类 号：TL13[核科学技术—核能科学]