PCVD直流脉冲沉积温度对TiN/TiSiN复合涂层高温氧化性能的影响  

Influence of PCVD DC Pulse Deposited Temperature on High Temperature Oxidation Resistance of TiN /TiSiN Multilayer Coatings

作　　者：宋之敏[1] 曾天[2] 韩纪梅[2] 高见[3] 李洪林[3] 丁武成[2] 刘岁林[1] 郑淑萍[1] 

机构地区：[1]四川大学分析测试中心 [2]四川大学材料科学与工程学院 [3]成都工具研究所有限公司

出　　处：《工具技术》2013年第12期17-20,共4页Tool Engineering

摘　　要：采用工业用直流脉冲等离子体增强化学气相沉积(PCVD)法在硬质合金刀具材料上制备了TiN/TiSiN复合涂层。对比研究了TiN及不同温度制备的TiN/TiSiN复合涂层高温抗氧化性能。研究表明:含有非晶阻隔抗氧化结构Si3N x的TiN/TiSiN复合涂层高温氧化性能远高于TiN涂层,TiN/TiSiN复合涂层提高到800℃,仍可避免出现较大面积氧化及脱落;PCVD直流脉冲沉积制备温度对涂层高温抗氧化能力有重要影响,550℃沉积制备的致密、均匀、颗粒小的复合涂层高温氧化性能最佳,600℃次之,500℃最差。The TiN coating and TiN/TiSiN multilayer coatings were deposited on substrate of WC - Co cutting tools u- sing an industrial dc pulsed plasma chemical vapor deposition（PCVD）. The high temperature oxidation resistance perform- ance of the coatings were investigated. The high temperature oxidation resistance performance of TiN/TiSiN muhilayer coat- ings were obviously better than that of TiN coating. The deposited temperature of dc pulse PCVD method Influences impor- tantly on the high temperature oxidation resistance of TiN/TiSiN muhilayer coatings. The high temperature oxidation resist- ance performance of TiN/TiSiN coated in the 550℃ is the best among that of the three TiN/TiSiN coatings. The perform- ance of TiN/TiSiN coating deposited in the 500℃ is the worst. The that in the 600℃ is the middle.

关 键 词：TIN TiSiN涂层 高温氧化 微观结构 表面形貌 

分 类 号：TG174.4[金属学及工艺—金属表面处理]