X射线源针孔成像系统优化设计研究  

Study on Optimization Design of X-ray Source Pinhole Imaging System

作　　者：谢文章[1] 邱睿[1] 李君利[1] 康玺[1] 

机构地区：[1]清华大学工程物理系粒子技术与辐射成像教育部重点实验室,高能辐射成像重点学科实验室,北京100084

出　　处：《原子能科学技术》2013年第12期2349-2354,共6页Atomic Energy Science and Technology

基　　金：国家自然科学基金资助项目(11105081,11075091,11275110)

摘　　要：为提高x射线源针孔成像系统的性能，对成像能区为10～100keV的x射线源针孔成像系统进行了优化设计研究。综合应用了理论分析和蒙特卡罗模拟的方法，首先根据X射线波长、准直器角响应和x射线穿透效应对针孔成像的不同影响结果设计了可有效控制成像分辨率和成像面积变化的船底型准直器，随后用蒙特卡罗方法对使用该准直器的针孔成像系统进行了模拟验证。结果表明，对于100keV以下的X射线，经船底型准直器后，成像的空间分辨率和亮斑亮度较稳定，能得到相对准确的X射线源定位、定量信息。In order to improve the performance of the X-ray source pinhole imaging system, the study on the optimization design of the pinhole imaging system for X-ray source in 10-100 keV was carried out with both theoretical analysis and Monte Carlo simulation. The wavelength and penetration effect of X-ray and angle response of collimator have different influences on the results of the pinhole imaging system. Based on those results, a bottom-shell-like collimator was designed to control the variation of imaging resolution and area. Then the pinhole imaging system with the collimator was verified with Monte Carlo simulation. The results show that the collimator can get the stable imaging resolution and spot brightness, and the relatively accurate orientation and quantitative information of X-ray source below 100 keV can be obtained.

关 键 词：X射线源 针孔成像 准直器设计 蒙特卡罗 

分 类 号：TL82[核科学技术—核技术及应用]