二甲基甲酰胺中Sm(Ⅲ)电化学性质及其合金膜研究  

Study on Electrochemical Properties and Alloy Film of Sm(Ⅲ)in DMF

作　　者：陆军[1] 王建朝[1] 王书海[1] 赵美峰[1] 胡博[1] 黄严[1] 

机构地区：[1]青海师范大学化学系,青海西宁810008

出　　处：《海南师范大学学报（自然科学版）》2013年第4期400-405,共6页Journal of Hainan Normal University（Natural Science）

基　　金：国家自然科学基金资助项目(51061016)

摘　　要：通过循环伏安法研究二甲基甲酰胺中Sm(Ⅲ)在Pt上的电化学性质,表明Sm(Ⅲ)在Pt上的还原为不可逆反应,同时测得传递系数α=0.0289,扩散系数D0=1.288×10-5cm2·s-1;通过塔菲尔曲线求得交换电流密度i0=1.596×10-7A/cm2;对Sm(Ⅲ)在Pt上离子成核机理研究表明,Sm(Ⅲ)在Pt电极上是按三维模式扩散控制下连续成核的;用恒电位法可以制得有金属光泽、附着力好、表面均匀致密的Sm-Ni-Co合金膜,与Ni-Co合金膜相比较结构性能有所提高.The electrochemical properties of Sm（III） on Pt electrode were studied by cyclicvoltammetry in DMF, The result showed that the reduction of Sm（III） on Pt electrode is not reversible. The transfer coefficients is 0.0289 and the diffusion coefficients is 1.288 ×10^-5cm^2·S^-1. The exchange current density is 1.596×10^-7A/cm^2 by tafel. The mechanism study showed that ion nucleation of Sm（III） on Pt electrode obeys the mechanism of continuous nucleation and three dimensional growth. Sm-Ni-Co alloy film with metallic luster, good adhesion, uniform surface and density can by got by potentiostatic electrodeposition method. The structure and performance are improved compared with the Ni-Co alloy film.

关 键 词：SM 二甲基甲酰胺 电化学性质 传递系数 扩散系数 离子成核机理 

分 类 号：O616[理学—无机化学] TQ153.2[理学—化学]