W含量对ZrWN复合膜的微结构与摩擦性能的影响  

Effect of W content on microstructure and friction properties of ZrWN composite films

作　　者：喻利花[1] 赵强[1] 马冰洋[1] 许俊华[1] 

机构地区：[1]江苏科技大学材料科学与工程学院,镇江212003

出　　处：《粉末冶金材料科学与工程》2013年第6期906-911,共6页Materials Science and Engineering of Powder Metallurgy

基　　金：国家自然科学基金资助项目(51074080);江苏省自然科学基金资助项目(BK2008240)

摘　　要：采用反应磁控溅射法分别在单晶硅（100）和不锈钢基底上沉积不同W含量的Zr1-xWxN（x=0.17，0.28，0.36，0.44，0.49）复合膜，利用扫描电镜、能谱仪、X射线衍射仪、纳米压痕仪和摩擦磨损试验机研究该复合薄膜的微结构、力学性能及摩擦性能，并探讨ZrWN复合膜的摩擦机理。结果表明：当x≤0.28时，复合膜呈fcc（Zr,W）N结构；当x为0.36~0.44时，复合膜呈fcc（Zr,W）N和fcc W2N结构；当x=0.49时复合膜为fcc（Zr，W）N、fcc W2N结构和β-W单质。Zr1-xWxN复合膜的硬度随x增加先增大后减小，当x=0.44时达到最大值，为36.0 GPa。随x增加， Zr1-xWxN复合膜的室温摩擦因数先减小后增大，摩擦表面生成的氧化物WO3对于降低摩擦因数起重要作用。Zr1-xWxN（x=0.17, 0.28, 0.36, 0.44, 0.49） composite films with different W contents were fabricated on wafers of silicon （100） and stainless steel by reactive magnetron sputtering technique. The microstructure, mechanical properties and friction properties were investigated by SEM-EDS analysis, X-ray diffraction, nano-indentation and high-temperature ball-on-disc tribo-meter. Tribological mechanism of ZrWN films was discussed. The results show that when x is no more than 0.28 in the film, the films exhibit fcc （Zr, W）N structure. When x is between 0.36 and 0.44, the films have a structure comprising fcc （Zr, W） N and fcc W2N. When x is 0.49, pureβ-W appears. The hardness of the Zr1-xWxN films increases and then decreases with increasing x. The maximum value is 36.0 GPa when x is 0.44. At room temperature, the friction coefficient of the Zr1-xWxN films shows down-up curve with increasing x. Oxide WO3 plays an important role in the friction process.

关 键 词：ZrWN复合膜 微结构 力学性能 摩擦性能 

分 类 号：TG174.44[金属学及工艺—金属表面处理]